The influence of gas impurities in the adsorbent nitrogen source on the adsorption process?

For 99.995% high-purity adsorbed carrier gas and adsorbate gas, the main impurity gas is moisture. Assuming that the content of water in the source gas is 0.004%, the amount of water that stays on the surface of the powder within 120 minutes at -195.8 ° C and a flow rate of 30 ml / min is 0.14 ml (volume under standard conditions). For a 500mg material with a specific surface area of ​​1m2 / g, the amount of water vapor required to form a monolayer of water on the surface is: 0.12 ml (standard condition), which is equivalent to the actual amount of water remaining on the surface of the powder. The surface of the material has been The water is saturated; if the test is continued without purging, the test result will not be correct. For the chromatographic pore size test, it is necessary to test 30 to 40 partial pressure points, and the effect is even more significant. If there is no purge treatment between the partial pressure points, the final result will not be the adsorption of nitrogen molecules by the solid material itself, but The particles coated with water molecules have adsorbed nitrogen molecules, and the pores have long been saturated with gaseous impurities H2O and CO2 that are easily adsorbed by high boiling points.
To eliminate the influence of gas impurities H2O, CO2, etc. in the adsorbate gas source, a cold trap gas purification device can be used. The cold trap is an effective way to eliminate high-boiling gas impurities; the cold trap equipped with a surface analyzer makes the sample High-boiling impurities such as adsorbed moisture are captured by the cold trap in advance, so that the water content of the purified high-purity nitrogen and high-purity helium gas is less than 10-17Pa, reaching an ultra-high-purity gas state;
3H-2000 series specific surface instrument is the only specific surface instrument equipped with cold trap in China, which is also one of the factors that this series of instruments can achieve high precision and high resolution

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